Densification of fused silica under 193-nm excitation
- 1 July 1997
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America B
- Vol. 14 (7) , 1606-1615
- https://doi.org/10.1364/josab.14.001606
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 23 references indexed in Scilit:
- Ultraviolet damage properties of various fused silica materialsPublished by SPIE-Intl Soc Optical Eng ,1995
- Degradation of fused silica at 193 nm and 213 nmPublished by SPIE-Intl Soc Optical Eng ,1995
- Deep-ultraviolet damage to fused silicaJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Excimer laser damage testing of optical materialsPublished by SPIE-Intl Soc Optical Eng ,1993
- Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silicaApplied Physics Letters, 1989
- Evidence for a wide continuum of polymorphs ina-Physical Review B, 1986
- Volume, index-of-refraction, and stress changes in electron-irradiated vitreous silicaJournal of Applied Physics, 1977
- Ionization dilatation effects in fused silica from 2 to 18-keV electron irradiationJournal of Applied Physics, 1974
- Compaction of ion-implanted fused silicaJournal of Applied Physics, 1974
- Radiation Effects in Silica at Low TemperaturesPhysical Review B, 1959