Sputtering conditions for depositing Co-Cr-Ta films with voidless morphology and nano-size domains
- 1 January 1996
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 32 (5) , 3816-3818
- https://doi.org/10.1109/20.539182
Abstract
No abstract availableKeywords
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