Role of ions in formation of amorphous Si:H network in electron cyclotron resonance plasma chemical vapor deposition
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 669-672
- https://doi.org/10.1016/s0022-3093(05)80209-1
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactorApplied Physics Letters, 1990
- Low-energy ion extraction with small dispersion from an electron cyclotron resonance microwave plasma streamApplied Physics Letters, 1987
- Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance PlasmaJapanese Journal of Applied Physics, 1983