A van der Pauw resistor structure for determining mask superposition errors on semiconductor slices
- 31 August 1978
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 21 (8) , 1013-1018
- https://doi.org/10.1016/0038-1101(78)90177-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Four-point sheet resistance correction factors for thin rectangular samplesSolid-State Electronics, 1977
- Four‐Point Sheet Resistance Measurements of Semiconductor Doping UniformityJournal of the Electrochemical Society, 1977
- Analysis of superposition errors in wafer fabricationMicroelectronics Reliability, 1977