Nitriding of bulk titanium and thin titanium films in a NH3 low pressure plasma
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 36 (1-4) , 520-529
- https://doi.org/10.1016/0169-4332(89)90946-x
Abstract
No abstract availableKeywords
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