A review of rapid thermal annealing (RTA) of B, BF 2 and As ions implanted into silicon
- 1 March 1985
- journal article
- review article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 251-260
- https://doi.org/10.1016/0168-583x(85)90562-2
Abstract
No abstract availableKeywords
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