Observation of a new domain configuration in polycrystalline FeSi films
- 1 September 1973
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 23 (5) , 276-278
- https://doi.org/10.1063/1.1654887
Abstract
FeSi films have been rf sputtered on glass, fused silica, and Si substrates. Sputter targets of 2 and 7 wt% Si were used, and the film thickness was varied between 0.1 and 4 μm. Several films, especially those on glass in the 0.5-μm-thickness range, showed a characteristic roughly rectangular domain structure. The films were isotropic. The structure has been analyzed with the longitudinal magneto-optic Kerr effect by rotating either the film or the demagnetizing field in the film plane. The magnetization made an angle of about 18° with the longer walls. A new magnetization process, ``wall rotation'', could be observed.Keywords
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