Progress in E-beam mask making for optical and x-ray lithography
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 141-149
- https://doi.org/10.1016/0167-9317(91)90065-l
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Pilot production of half-micron x-ray masksJournal of Vacuum Science & Technology B, 1989
- Effect Of Charging On Pattern Placement Accuracy In E-Beam LithographyPublished by SPIE-Intl Soc Optical Eng ,1989
- SOR Lithography in West GermanyPublished by SPIE-Intl Soc Optical Eng ,1989
- Fabrication Of 5X Reticles Fore 16M DRAMS By Using A Variable-Shaped Electron-Beam SystemPublished by SPIE-Intl Soc Optical Eng ,1989
- Fully scaled 0.5 μm metal–oxide semiconductor circuits by synchrotron x-ray lithography: Mask fabrication and characterizationJournal of Vacuum Science & Technology B, 1988
- Recent advances with the variable axis immersion lensJournal of Vacuum Science & Technology B, 1988
- EL3 system for quarter-micron electron beam lithographyJournal of Vacuum Science & Technology B, 1988