Modeling of electron cyclotron resonance discharges
- 1 January 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 23 (4) , 623-627
- https://doi.org/10.1109/27.467983
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Factors affecting the Cl atom density in a chlorine dischargeJournal of Applied Physics, 1992
- Theoretical and Experimental Investigations of Chlorine RF Glow Discharges: I . TheoreticalJournal of the Electrochemical Society, 1992
- Ion transport in an electron cyclotron resonance plasmaJournal of Applied Physics, 1991
- Neutral gas temperatures in a multipolar electron cyclotron resonance plasmaApplied Physics Letters, 1991
- Silicon nitride formation from a silane–nitrogen electron cyclotron resonance plasmaJournal of Vacuum Science & Technology A, 1991
- Ion and neutral temperatures in electron cyclotron resonance plasma reactorsApplied Physics Letters, 1991
- Ion energetics in electron cyclotron resonance dischargesJournal of Vacuum Science & Technology A, 1990
- Electron cyclotron resonance plasma stream source for plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1989
- Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma streamJournal of Vacuum Science & Technology A, 1988
- A kinetic study of the plasma-etching process. I. A model for the etching of Si and SiO2 in CnFm/H2 and CnFm/O2 plasmasJournal of Applied Physics, 1982