The electrical properties of resistive and dielectric thin films prepared by reactive sputtering from a tantalum-titanium composite target
- 1 July 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 52 (1) , 69-75
- https://doi.org/10.1016/0040-6090(78)90256-0
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Properties of Anodic Films Formed on Reactively Sputtered TantalumJournal of the Electrochemical Society, 1966
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964