Electronic stopping power for Monte Carlo simulation of ion implantation into SiC
- 1 January 1999
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 147 (1-4) , 68-73
- https://doi.org/10.1016/s0168-583x(98)00548-5
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Digital CMOS IC's in 6H-SiC operating on a 5-V power supplyIEEE Transactions on Electron Devices, 1998
- Compensation implants in 6H–SiCJournal of Applied Physics, 1997
- Evaluation of ohmic contacts to p-type 6H-SiC created by C and Al coimplantationIEEE Electron Device Letters, 1997
- Monte Carlo simulation of arsenic ion implantation in (100) single-crystal siliconIEEE Transactions on Semiconductor Manufacturing, 1996
- Modeling of ion implantation in single-crystal siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Modeling of electronic stopping and damage accumulation during arsenic implantation in siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Nonlinear stopping power of an electron gas for slow ionsPhysical Review A, 1986
- The Stopping and Range of Ions in MatterPublished by Springer Nature ,1985
- Effective stopping-power charges of swift ions in condensed matterPhysical Review B, 1982
- Computer simulation of atomic-displacement cascades in solids in the binary-collision approximationPhysical Review B, 1974