IR study of ultrathin plasma SiO2 and plasma treated thermal SiO2 films
- 1 August 1986
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 85 (3) , 382-392
- https://doi.org/10.1016/0022-3093(86)90010-4
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
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