Optical requirements for projection lithography
- 31 October 1981
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 24 (10) , 975-980
- https://doi.org/10.1016/0038-1101(81)90120-9
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Coherent Illumination Improves Step-And-Repeat Printing On WafersPublished by SPIE-Intl Soc Optical Eng ,1979
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- Computer simulation of exposure and development of a positive photoresistJournal of Applied Physics, 1979
- Method for the calculation of partially coherent imageryApplied Optics, 1978
- Performance characteristics of diazo-type photoresists under e-beam and optical exposureIEEE Transactions on Electron Devices, 1978
- Characterization of positive photoresistIEEE Transactions on Electron Devices, 1975
- Linewidth variations in photoresist patterns on profiled surfacesIEEE Transactions on Electron Devices, 1975
- Optical lithographyIEEE Transactions on Electron Devices, 1975