Preparation of ZnO thin films by plasma-enhanced organometallic chemical vapour deposition
- 1 October 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 96 (2) , 149-154
- https://doi.org/10.1016/0040-6090(82)90613-7
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- A new technique for the vapour phase epitaxial growth of ZnO as a guided-wave optical materialThin Solid Films, 1981
- Optical and electrical properties of ZnO films prepared by spray pyrolysis for solar cell applicationsJournal of Vacuum Science and Technology, 1979
- Ionized-cluster beam epitaxyJournal of Crystal Growth, 1978
- Plasma deposition of GaP and GaNJournal of Applied Physics, 1978
- Studies of the optimum conditions for growth of rf-sputtered ZnO filmsJournal of Applied Physics, 1975
- The epitaxial growth of ZnO on sapphire and MgAl spinel using the vapor phase reaction of Zn and H2OJournal of Electronic Materials, 1973
- The use of metalorganics in the preparation of semiconductor materials: Growth on insulating substratesJournal of Crystal Growth, 1972
- High Resistivity Transparent ZnO Thin FilmsJournal of Vacuum Science and Technology, 1970