On the primary process in plasma-chemical and photochemical vapor deposition from silane: An ab initio study of unimolecular decomposition of SiH4 in the lowest triplet state
- 1 August 1985
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 118 (5) , 498-502
- https://doi.org/10.1016/0009-2614(85)85340-9
Abstract
No abstract availableKeywords
Funding Information
- University of Tokyo (59103011)
- Ministry of Education, Culture, Sports, Science and Technology
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