Influence of the plasma parameters on the properties of a-Si films prepared by glow-discharge deposition method
- 1 January 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 195-200
- https://doi.org/10.1016/0022-3093(80)90593-1
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Structural interpretation of the vibrational spectra of-Si: H alloysPhysical Review B, 1979
- Optical and photoconductive properties of discharge-produced amorphous siliconJournal of Applied Physics, 1977
- Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputteringPhysical Review B, 1977
- On the deposition of amorphous silicon films from glow discharge plasmas of silaneThin Solid Films, 1977
- Properties of amorphous silicon films— Dependence on deposition conditionsJournal of Non-Crystalline Solids, 1975
- Properties of glow-discharge deposited amorphous germanium and siliconJournal of Non-Crystalline Solids, 1970