On the deposition of amorphous silicon films from glow discharge plasmas of silane
- 1 January 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 40, L23-L25
- https://doi.org/10.1016/0040-6090(77)90095-5
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976
- Effects of Reaction Conditions on the Plasma Polymerization of EthyleneJournal of Macromolecular Science: Part A - Chemistry, 1974
- Properties of glow-discharge deposited amorphous germanium and siliconJournal of Non-Crystalline Solids, 1970
- The Conversion of Silane to Higher Silanes in a Silent Electric DischargeInorganic Chemistry, 1962