Annealing behavior of gold absorber in x-ray masks
- 31 March 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 17 (1-4) , 189-192
- https://doi.org/10.1016/0167-9317(92)90039-t
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Stress and thermal expansion of β–SiC films by the vibrating-membrane methodJournal of Materials Research, 1991
- Internal stress and internal friction in thin-layer microelectronic materialsJournal of Applied Physics, 1990
- Dynamical method for the thermomechanical study of thin membranesJournal of Vacuum Science & Technology B, 1989
- Silicon X-ray masks: Pattern placement and overlay accuracyMicroelectronic Engineering, 1986
- Effects of stress on the stability of x-ray masksJournal of Vacuum Science & Technology B, 1986
- B-Si masks for storage ring X-ray lithographyPublished by SPIE-Intl Soc Optical Eng ,1984