Measurements of oxygen adsorption on Si(111) surfaces by LEED
- 31 March 1969
- journal article
- Published by Elsevier in Surface Science
- Vol. 14 (1) , 93-102
- https://doi.org/10.1016/0039-6028(69)90047-8
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
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- A note on the sensitivity of leed to surface perfectionSurface Science, 1967
- Oxygen sticking coefficients on clean semiconductor surfacesSurface Science, 1965
- Measurement of oxygen adsorption on silicon by ellipsometryJournal of Physics and Chemistry of Solids, 1965
- Scattering Factors and Other Properties of Low-Energy Electron DiffractionJournal of Applied Physics, 1963
- Structural Properties of Cleaved Silicon and Germanium SurfacesJournal of Applied Physics, 1963
- Structures of Clean Surfaces of Germanium and Silicon. IJournal of Applied Physics, 1963
- Low Voltage Electron Diffraction Study of the Oxidation and Reduction of SiliconJournal of Applied Physics, 1962
- Structure and Adsorption Characteristics of Clean Surfaces of Germanium and SiliconThe Journal of Chemical Physics, 1959