Electron Quantum Interference andNoise in Bismuth
- 9 January 1989
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 62 (2) , 195-198
- https://doi.org/10.1103/physrevlett.62.195
Abstract
The resistance noise of thin Bi films of lateral dimensions 1-10 μm increases at low temperatures approximately as , and the noise at 1 K is larger than at room temperature. The noise magnitude is reduced by a factor of 2 above a temperature-dependent characteristic magnetic field. These phenomena demonstrate that below liquid-nitrogen temperature the noise in a weakly disordered metal arises from defect-mediated quantum interference of conduction electrons.
Keywords
This publication has 19 references indexed in Scilit:
- Weak localization in thin films: a time-of-flight experiment with conduction electronsPublished by Elsevier ,2002
- ac method for measuring low-frequency resistance fluctuation spectraReview of Scientific Instruments, 1987
- Universal conductance fluctuations in metals: Effects of finite temperature, interactions, and magnetic fieldPhysical Review B, 1987
- Sensitivity of the Conductance of a Disordered Metal to the Motion of a Single Atom: Implications forNoisePhysical Review Letters, 1986
- Aperiodic magnetoresistance oscillations in narrow inversion layers in SiPhysical Review Letters, 1985
- Universal Conductance Fluctuations in MetalsPhysical Review Letters, 1985
- Disordered electronic systemsReviews of Modern Physics, 1985
- Magnetoresistance of small, quasi-one-dimensional, normal-metal rings and linesPhysical Review B, 1984
- Magnetoconductance and quantized confinement in narrow silicon inversion layersSurface Science, 1984
- Concentration and mobility of charge carriers in thin polycrystalline films of bismuthThin Solid Films, 1978