Relative sensitivity factors for quantitative Auger analysis of binary alloys
- 31 January 1977
- journal article
- Published by Elsevier in Surface Science
- Vol. 62 (1) , 1-20
- https://doi.org/10.1016/0039-6028(77)90424-1
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Auger study of preferred sputtering on binary alloy surfacesSurface Science, 1976
- Relative sputtering yields and quantitative surface analysis by Auger spectroscopyJournal of Vacuum Science and Technology, 1976
- Quantitative auger electron spectroscopy analysis of AgPd and NiPd alloysSurface Science, 1975
- A first order approximation to quantitative auger analysis in the range 100 to 1000eV using the CMA analyzerSurface Science, 1975
- AES studies of surface composition of AgCu alloysSurface Science, 1975
- Quantitative analysis of light elements (nitrogen, carbon, and oxygen) in sputtered tantalum films by Auger electron spectroscopy and secondary ion mass spectrometry (SIMS)Analytical Chemistry, 1974
- Retrieval of electron-excited Auger structure by dynamic background subtractionApplied Physics Letters, 1974
- Quantitative Auger analysis using integration techniquesPhysics Letters A, 1973
- Quantitative auger analysis of copper-nickel alloy surfaces after argon ion bombardmentSurface Science, 1973
- Auger Electron Spectroscopy Studies of Sputter Deposition and Sputter Removal of Mo from Various Metal SurfacesJournal of Applied Physics, 1972