Optical properties of thermally stabilized ion implantation amorphized silicon
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 19-20, 577-581
- https://doi.org/10.1016/s0168-583x(87)80115-5
Abstract
No abstract availableKeywords
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