Synthesis of photosensitive and thermosetting poly(phenylene ether) based on poly[2,6‐di(3‐methyl‐2‐butenyl)phenol‐co‐2,6‐dimethyl‐phenol] and a photoacid generator
- 22 November 2004
- journal article
- research article
- Published by Wiley in Journal of Polymer Science Part A: Polymer Chemistry
- Vol. 43 (1) , 149-156
- https://doi.org/10.1002/pola.20490
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Synthesis of thermosetting poly(phenylene ether) containing allyl groupsPolymer, 2004
- Low dielectric constant polymers for microelectronicsProgress in Polymer Science, 2001
- Recent Development in Photosensitive Polyimide (PSPI)Journal of Photopolymer Science and Technology, 2001
- Photopatternable insulating materialsApplied Surface Science, 1996
- Syntheses and Properties of Allylated Poly(2,6-dimethyl-1,4-phenylene ether)Published by American Chemical Society (ACS) ,1995
- Chain orientation and anisotropies in optical and dielectric properties in thin films of stiff polyimidesJournal of Polymer Science Part B: Polymer Physics, 1992
- Photoreactive polymers for electronicsAdvanced Materials, 1990
- New high temperature stable positive photoresists based on hydroxy polyimides and polyamides containing the hexafluoroisopropylidene (6‐f) linking groupPolymer Engineering & Science, 1989
- Polymerization by oxidative coupling. II. Oxidation of 2,6‐disubstituted phenolsJournal of Polymer Science, 1962