Characterization of rf-sputtered yttrium oxide films
- 1 May 1992
- Vol. 43 (5-7) , 753-755
- https://doi.org/10.1016/0042-207x(92)90126-h
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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- Yttrium oxide/silicon dioxide: a new dielectric structure for VLSI/ULSI circuitsIEEE Electron Device Letters, 1988
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- Dielectric Properties of Y2O3 Thin Films Prepared by Vacuum EvaporationJapanese Journal of Applied Physics, 1970