1 /spl mu/m MOSFET VLSI technology. II. Device designs and characteristics for high-performance logic applications
- 1 April 1979
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Solid-State Circuits
- Vol. 14 (2) , 247-255
- https://doi.org/10.1109/jssc.1979.1051171
Abstract
For pt.I see ibid., vol.SC14, no.2, p.240 (1979). Micrometer-dimension n-channel silicon-gate MOSFETs optimized for high-performance logic applications have been designed and characterized for both room-temperature and liquid-nitrogen-temperature operation. Appropriate choices of design parameters are shown to give proper device thresholds which are reasonably independent of channel length and width. Depletion-type devices are characterized at room temperature for load device use. Logic performance capability is demonstrated by test results on NOR circuits for representative fanout and loading conditions. Unloaded ring oscillators achieved switching delays down to 240 ps at room temperature and down to 100 ps at liquid nitrogen temperature.Keywords
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