INVESTIGATION OF HYDROGEN AND CHLORINE AT THE SiO2/Si INTERFACE

This publication has 13 references indexed in Scilit:

• Hydrogen ratios and profiles in deposited amorphous and polycrystalline films and in metals using nuclear techniques
  Nuclear Instruments and Methods, 1980
• The Role of Hydrogen in SiO2 Films on Silicon
  Journal of the Electrochemical Society, 1979
• Depth profiling of sodium in SiO2 films by secondary ion mass spectrometry
  Applied Physics Letters, 1978
• Secondary ion quadrupole mass spectrometer for depth profiling—design and performance evaluation
  Review of Scientific Instruments, 1978
• Hydrogen concentration profiles in quartz determined by a nuclear reaction technique
  Physics and Chemistry of Minerals, 1978
• The use of nuclear reactions and SIMS for quantitative depth profiling of hydrogen in amorphous silicon
  Applied Physics Letters, 1977
• New precision technique for measuring the concentration versus depth of hydrogen in solids
  Applied Physics Letters, 1976
• The depth distribution of hydrogen in lunar materials
  Earth and Planetary Science Letters, 1973
• A technique for measuring hydrogen concentration versus depth in solid samples
  Nuclear Instruments and Methods, 1973
• Hydrides and Hydroxyls in Thin Silicon Dioxide Films
  Journal of the Electrochemical Society, 1971