Oxidation protective barrier coatings for high-temperature polymer matrix composites
- 1 June 1994
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 9 (6) , 1583-1595
- https://doi.org/10.1557/jmr.1994.1583
Abstract
Three coating techniques (metal-organic chemical vapor deposition, magnetron sputtering, and plasma-enhanced chemical vapor deposition) were employed to deposit different coating materials (alumina, a superalloy, and silicon nitride) on graphite-fiber-reinforced polyimide composites to protect against oxidation at elevated temperatures. Adhesion and integrity of the coatings were evaluated by isothermal aging (371 °C for 500 h) and thermal cycling (25 to 232 °C for 1000 cycles and −18 to 232 °C for 300 cycles). Best results were achieved with a plasma-deposited, amorphous silicon nitride (a-SiN: H) coating, which withstood stresses from 0.18 to −1.6 GPa. The major factors affecting the suitability of a-SiN: H as an oxidation protective coating are the surface finish of the polymer composite and the presence of a sizable hydrogen content in the coating.Keywords
This publication has 23 references indexed in Scilit:
- Relationship between the stress and bonding properties of amorphous SiNx:H filmsJournal of Applied Physics, 1992
- Characteristics of silicon nitride deposited by plasma-enhanced chemical vapor deposition using a dual frequency radio-frequency sourceJournal of Applied Physics, 1992
- Evaluation of internal stresses present in chemical vapor deposition diamond filmsSurface and Coatings Technology, 1991
- Low hydrogen content stoichiometric silicon nitride films deposited by plasma-enhanced chemical vapor depositionJournal of Applied Physics, 1991
- Intrinsic stress in diamond films prepared by microwave plasma CVDJournal of Applied Physics, 1991
- Microhardness and internal stress of Si3N4-SiC films prepared by plasma CVDJournal of Materials Science Letters, 1986
- Chemical Vapor Deposition of Al2 O 3 Thin Films under Reduced PressuresJournal of the Electrochemical Society, 1985
- Elastic stiffness and thermal expansion coefficients of various refractory silicides and silicon nitride filmsThin Solid Films, 1980
- Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum AlkoxideJournal of the Electrochemical Society, 1967
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909