Ion projection lithography: status of tool and mask developments
- 1 September 2001
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 57-58, 145-153
- https://doi.org/10.1016/s0167-9317(01)00506-8
Abstract
No abstract availableKeywords
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- Pattern-specific emulation (PSE) for ion-beam projection lithography masks using finite element analysisPublished by SPIE-Intl Soc Optical Eng ,1998