Analysis and modelling of tetraethoxysilane pyrolysis
- 1 January 1988
- journal article
- Published by Elsevier in Journal of Analytical and Applied Pyrolysis
- Vol. 13 (1-2) , 141-149
- https://doi.org/10.1016/0165-2370(88)80054-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Chemical Vapor Deposition: A Chemical Engineering PerspectiveReviews in Chemical Engineering, 1985
- The Deposition of Silicon Dioxide Films at Reduced PressureJournal of the Electrochemical Society, 1979
- Modeling of low-pressure deposition of SiO2by decomposition of TEOSIEEE Transactions on Electron Devices, 1979
- Low-pressure chemical vapor deposition for very large-scale integration processing—A reviewIEEE Transactions on Electron Devices, 1979
- A comparative study of the pyrolyses of the tetramethyl derivatives of silicon, germanium, and tin using a wall-less reactorThe Journal of Physical Chemistry, 1978