A critical comparison of silicide film deposition techniques
- 1 August 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 118 (2) , 163-170
- https://doi.org/10.1016/0040-6090(84)90068-3
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Properties of low-pressure CVD tungsten silicide for MOS VLSI interconnectionsIEEE Transactions on Electron Devices, 1983
- Properties of MoSi2 and WSi2, magnetron cosputtered from elemental targetsJournal of Electronic Materials, 1982
- Electrical Properties of Composite Evaporated Silicide/Polysilicon ElectrodesJournal of the Electrochemical Society, 1982
- Moving Resistive Wire ElectrodesJournal of the Electrochemical Society, 1977