Reaction pathways in organometallic chemical vapor deposition(OMCVD)
- 1 May 1992
- journal article
- Published by Wiley in Advanced Materials
- Vol. 4 (5) , 375-378
- https://doi.org/10.1002/adma.19920040514
Abstract
No abstract availableKeywords
This publication has 25 references indexed in Scilit:
- Focused ion beam induced deposition of platinumJournal of Vacuum Science & Technology B, 1990
- Photochemical deposition of thin films from the metal hexacarbonylsThe Journal of Physical Chemistry, 1990
- Characterization of (methylcyclopentadienyl)trimethylplatinum and low-temperature organometallic chemical vapor deposition of platinum metalJournal of the American Chemical Society, 1989
- Metal organic chemical vapor deposition (MOCVD) perspectives and prospectsAdvanced Materials, 1989
- Low-Temperature Organometallic Chemical Vapor Deposition of Transition MetalsMRS Proceedings, 1988
- Chemical Vapor Deposition of Metals for Integrated Circuit ApplicationsJOM, 1985
- Thin Alloy Films for Metallization in Microelectronic DevicesPublished by Elsevier ,1982
- Electron spectroscopy applied to the study of reactivity at metal surfaces — A reviewSurface Science, 1977
- L.—Action of carbon monoxide on nickelJournal of the Chemical Society, Transactions, 1890
- Ueber metallisches Wolfram und MolybdänEuropean Journal of Organic Chemistry, 1855