Aqueous phase silylation a new route to plasma developable high resolution resists
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 535-538
- https://doi.org/10.1016/0167-9317(90)90165-p
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Super: A bmicron ositive dry tch esist; a candidate for DUV-lithographyMicroelectronic Engineering, 1989
- Desire : A Novel Dry Developed Resist SystemPublished by SPIE-Intl Soc Optical Eng ,1986
- The Scope and Mechanism of New Positive Tone Gas‐Phase‐Functionalized Plasma‐Developed ResistsJournal of the Electrochemical Society, 1984