New Reliable Structure for High Temperature Measurement of Silicon Wafers Using a Specially Attached Thermocouple

This publication has 6 references indexed in Scilit:

• Rapid thermal annealing of BF₂⁺implanted, preamorphized silicon
  IEEE Electron Device Letters, 1983
• Incoherent light-induced diffusion of arsenic into silicon from a spin-on source
  Applied Physics Letters, 1983
• Short Time Annealing
  Journal of the Electrochemical Society, 1983
• Radiation Annealing of Boron-Implanted Silicon with a Halogen Lamp
  Japanese Journal of Applied Physics, 1980
• Fabrication of novel three-dimensional microstructures by the anisotropic etching of
  IEEE Transactions on Electron Devices, 1978
• Anisotropic etching of silicon
  IEEE Transactions on Electron Devices, 1978