The diffusion of oxygen in silicon and germanium
- 1 August 1960
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 15 (1-2) , 108-111
- https://doi.org/10.1016/0022-3697(60)90106-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Mechanism of the Formation of Donor States in Heat-Treated SiliconPhysical Review B, 1958
- Temperature Dependence of Internal Friction in GermaniumPhysical Review B, 1958
- Diffusion of Oxygen in SiliconJournal of Applied Physics, 1957
- Electrical and Optical Properties of Heat-Treated SiliconPhysical Review B, 1957
- Effect of small quantities of carbon and nitrogen on the elastic and plastic properties of ironPhysica, 1941