Diffusion of Oxygen in Silicon
- 1 July 1957
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 28 (7) , 819-820
- https://doi.org/10.1063/1.1722863
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Electrical and Optical Properties of Heat-Treated SiliconPhysical Review B, 1957
- Copper Precipitation on Dislocations in SiliconJournal of Applied Physics, 1956
- The Use of an Interference Microscope for Measurement of Extremely Thin Surface LayersBell System Technical Journal, 1956
- Resistivity changes in silicon single crystals induced by heat treatmentActa Metallurgica, 1955