Modification of the theory of threshold voltage shift of MOS transistors by ion implantation
- 16 July 1975
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 30 (1) , 147-153
- https://doi.org/10.1002/pssa.2210300115
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- MOS threshold shifting by ion implantationSolid-State Electronics, 1973
- THE ADJUSTMENT OF MOS TRANSISTOR THRESHOLD VOLTAGE BY ION IMPLANTATIONApplied Physics Letters, 1971