Characteristics of a Monodisperse PHS-Based Positive Resist (MDPR) in KrF Excimer Laser Lithography
- 1 December 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (12S) , 4316-4320
- https://doi.org/10.1143/jjap.31.4316
Abstract
A new chemically amplified monodisperse PHS-based positive resist (MDPR) has been developed for KrF excimer laser lithography. MDPR is an alkali-developable single-layer resist, composed of partially tBOC-protected PHS, a dissolution inhibitor and a photoacid generator. We used nearly monodisperse PHS synthesized by living polymerization and obtained fine patterning. The MDPR has a high contrast value γ of 4, which results in excellent resolution: the MDPR can easily generate l & s patterns down to 0.25 µm in width at 90 mJ/cm2. A higher sensitivity of 45 mJ/cm2 and a contrast value γ of 12 were achieved with a blended MDPR.Keywords
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