Effect of Xe★ bombardment on the formation of highly oriented rutile-type titanium oxide films
- 1 January 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 312 (1-2) , 1-3
- https://doi.org/10.1016/s0040-6090(97)00168-5
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- A new TiO2 film deposition process in a supercritical fluidSurface and Coatings Technology, 1994
- Characteristics of titanium oxide films deposited by an activated reactive evaporation methodJournal of Materials Research, 1994
- Study of porosity of titanium oxide films by X-ray photoelectron spectroscopy and IR transmittanceThin Solid Films, 1994
- Process effects on structural properties of TiO2 thin films by reactive sputteringJournal of Vacuum Science & Technology A, 1992
- Solution precursor chemical vapor deposition of titanium oxide thin filmsThin Solid Films, 1991
- Synthesis of compound thin films by dual ion beam deposition. II. Properties of aluminum-nitrogen filmsJournal of Applied Physics, 1985
- The development of grain structure during growth of metallic filmsActa Metallurgica, 1984
- The surface structure of silver crystals after argon-ion bombardmentJournal of Physics and Chemistry of Solids, 1959
- LXXXVII.Investigation of the orientations in thin evaporated metallic films by the method of electron diffractionJournal of Computers in Education, 1933