Low-temperature i n s i t u formation of Y-Ba-Cu-O high T c superconducting thin films by plasma-enhanced metalorganic chemical vapor deposition
- 4 June 1990
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 56 (23) , 2342-2344
- https://doi.org/10.1063/1.103249
Abstract
Highly textured, highly dense, superconducting YBa2Cu3O7−x thin films with mirror‐like surfaces have been prepared, in situ, at a reduced substrate temperature as low as 570 °C by a remote microwave plasma‐enhanced metalorganic chemical vapor deposition process (PE‐MOCVD). Nitrous oxide was used as the oxidizer gas. The as‐deposited films grown by PE‐MOCVD show attainment of zero resistance at 72 K. PE‐MOCVD was carried out in a commercial scale MOCVD reactor.Keywords
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