A study on structures and formation mechanisms of self-assembled monolayers of n-alkyltrichlorosilanes using infrared spectroscopy and atomic force microscopy
- 18 December 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 379 (1-2) , 230-239
- https://doi.org/10.1016/s0040-6090(00)01544-3
Abstract
No abstract availableKeywords
This publication has 40 references indexed in Scilit:
- Substrate Effects on the Formation of Alkylsiloxane MonolayersLangmuir, 1999
- Kinetics of self-assembled silane monolayers at various temperatures: evidence of 2D foamThin Solid Films, 1998
- Temperature influence on the formation of silanized monolayers on silica: an atomic force microscopy studySurface Science, 1996
- Growth of Self-Assembled n-Alkyltrichlorosilane Films on Si(100) Investigated by Atomic Force MicroscopyLangmuir, 1995
- Silanization of Solid Substrates: A Step Toward ReproducibilityLangmuir, 1994
- Role of Solvent on the Silanization of Glass with OctadecyltrichlorosilaneLangmuir, 1994
- An Intrinsic Relationship between Molecular Structure in Self-Assembled n-Alkylsiloxane Monolayers and Deposition TemperatureThe Journal of Physical Chemistry, 1994
- Evidence of a transition temperature for the optimum deposition of grafted monolayer coatingsNature, 1992
- Interaction of silicon surfaces silanized with octadecylchlorosilanes with octadecanoic acid and octadecanamine studied by ellipsometry, X-ray photoelectron spectroscopy and reflectance Fourier transform infrared spectroscopyLangmuir, 1992
- Silanation of silica surfaces. A new method of constructing pure or mixed monolayersLangmuir, 1991