Electrical degradation of n-Si/PtSi/(TiW)/Al Schottky contacts induced by thermal treatments
- 1 November 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 97 (4) , 325-331
- https://doi.org/10.1016/0040-6090(82)90524-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- A review of the theory, technology and applications of metal-semiconductor rectifiersThin Solid Films, 1978
- Aluminum—Silicon Schottky barriers and ohmic contacts in integrated circuitsIEEE Transactions on Electron Devices, 1976
- Electrical and mechanical features of the platinum silicide-aluminum reactionJournal of Applied Physics, 1973