Self Aligned Nitridation of TiSi₂: A TiN/TiSi₂Contact Structure

Publisher Website

1 January 1984

journal article
Published by Springer Nature in MRS Proceedings

Vol. 37
https://doi.org/10.1557/proc-37-607

Abstract

No abstract available

Keywords

This publication has 3 references indexed in Scilit:

TiSi₂/TiN–A Stable Multilayered Contact Structure for Shallow Implanted Junctions in VLSI Technology
Physica Scripta, 1983
Applications of TiN thin films in silicon device technology
Thin Solid Films, 1982
Interfacial reactions between aluminum and transition-metal nitride and carbide films
Journal of Applied Physics, 1982