Deposition of copper oxide, titanium oxide and indium tin oxide films by reactive magnetron sputtering
- 31 December 1991
- Vol. 42 (1-2) , 53-55
- https://doi.org/10.1016/0042-207x(91)90077-v
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- High rate deposition of transparent conducting films by modified reactive planar magnetron sputtering of Cd2Sn alloyJournal of Vacuum Science and Technology, 1981
- Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixturesJournal of Vacuum Science and Technology, 1980
- Oxidation of an aluminum magnetron sputtering target in Ar/O2 mixturesJournal of Applied Physics, 1980
- Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide filmsThin Solid Films, 1979
- D.C. cathode sputtering: influence of the oxygen content in the gas flow on the discharge currentThin Solid Films, 1976