High-Vacuum Codeposition of Niobium Nitride
- 1 June 1972
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 43 (6) , 2869-2872
- https://doi.org/10.1063/1.1661607
Abstract
A technique has been developed for the reactive high‐vacuum codeposition of niobium nitride at rates in excess of several hundred Å/sec. With gaseous ammonia as the nitrogen source, films with transition temperatures in excess of 13°K have been fabricated. The depression of the transition temperature from values reported for sputtered films is attributed to ammonia decomposition chemistry. In addition, 4.2°K critical currents in excess of 106 A/cm2 have been measured for 1‐μ‐thick films.This publication has 6 references indexed in Scilit:
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- THE UPPER CRITICAL FIELD H c2 OF NbN FILM PREPARED BY REACTIVE SPUTTERINGApplied Physics Letters, 1969
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