Metallorganic Cheamcal Vapor Deposition (Mocvd) of Titanium-Based Ferroelectric Thin Films

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1 January 1993

journal article
Published by Springer Nature in MRS Proceedings

Vol. 310
https://doi.org/10.1557/proc-310-241

Abstract

No abstract available

Keywords

This publication has 5 references indexed in Scilit:

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