Pseudomorphic deposits of cobalt on copper

Publisher Website
Google Scholar
Abstract
Cobalt was deposited in ultra-high vacuum onto (001) copper surfaces prepared inside the vacuum chamber. If the copper substrate was at room temperature during film growth then the cobalt grew approximately as a monolayer. The structure and lattice parameter of the cobalt remained the same as the copper until its thickness reached about 20 Å. At this thickness long dislocations to accommodate part of the difference between the lattice parameters of cobalt and copper were generated. Many of these dislocations were unusual in that they were imperfect. The stacking faults associated with them converted a little of the f.c.c. cobalt into the stable h.c.p. structure. If the copper was hot (350°C) during the deposition of cobalt, then film growth began with the formation of three-dimensional nuclei. Nuclei less than about 375 Å in radius were f.c.c. and were strained to match the copper lattice.