A quantitative study of compositional profiles of chemical vapour-deposited strained silicon–germanium/silicon layers by transmission electron microscopy
- 26 January 1999
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 197 (1-2) , 113-128
- https://doi.org/10.1016/s0022-0248(98)00930-0
Abstract
No abstract availableKeywords
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