Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO 2 and SiO 2 films for process control
- 1 August 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 351 (1-2) , 42-47
- https://doi.org/10.1016/s0040-6090(99)00152-2
Abstract
No abstract availableKeywords
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