Microstructure modification of amorphous titanium oxide thin films during annealing treatment
- 19 May 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 300 (1-2) , 113-121
- https://doi.org/10.1016/s0040-6090(96)09510-7
Abstract
No abstract availableKeywords
This publication has 31 references indexed in Scilit:
- Preparation of TiO2 and Al2O3 thin films by ion-beam induced chemical vapour depositionPublished by Elsevier ,2002
- Photooxidative self-cleaning transparent titanium dioxide films on glassJournal of Materials Research, 1995
- Electrochromic behaviour of sputtered titanium oxide thin filmsThin Solid Films, 1995
- Enhancement of the deposition rate of TiO2 film in radio frequency reactive sputteringJournal of Vacuum Science & Technology A, 1994
- Nucleation and growth in TiO2 films prepared by sputtering and evaporationThin Solid Films, 1994
- Thermal conductivity of sputtered and evaporated SiO2 and TiO2 optical coatingsApplied Physics Letters, 1994
- Ion beam induced chemical vapor deposition for the preparation of thin film oxidesThin Solid Films, 1994
- Influence of substrate on structural properties of TiO2 thin films obtained via MOCVDThin Solid Films, 1994
- The influence of thermal annealing on the structural, electrical and optical properties of TiO2-x thin filmsApplied Surface Science, 1993
- Structural and electronic properties of titanium dioxidePhysical Review B, 1992