Optical absorption of some polymers in the region 240–170 nm
- 13 January 1986
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 48 (2) , 192-194
- https://doi.org/10.1063/1.96940
Abstract
Absorption coefficients for some technologically important polymer materials are given in the wavelength range ∼240–170 nm. Absorption coefficients at 193 nm for these polymers show a wide range of values from ∼2×102 cm−1 for polytetrafluoroethylene (Teflon) to ∼4×105 cm−1 for polyimide. The general nature of the optical properties of polymers in the vacuum ultraviolet is also discussed.Keywords
This publication has 14 references indexed in Scilit:
- Laser ablation of organic polymers: Microscopic models for photochemical and thermal processesJournal of Applied Physics, 1985
- Excimer laser ablation and thermal coupling efficiency to polymer filmsJournal of Applied Physics, 1985
- Theory of etching of polymers by far-ultraviolet high-intensity pulsed laser- and long-term irradiationThe Journal of Physical Chemistry, 1984
- Emission spectra, surface quality, and mechanism of excimer laser etching of polyimide filmsApplied Physics Letters, 1984
- Self-developing UV photoresist using excimer laser exposureJournal of Applied Physics, 1983
- Direct etching of polymeric materials using a XeCl laserApplied Physics Letters, 1983
- Self-developing resist with submicrometer resolution and processing stabilityApplied Physics Letters, 1983
- Ablative photodecomposition: action of far-ultraviolet (193 nm) laser radiation on poly(ethylene terephthalate) filmsJournal of the American Chemical Society, 1982
- Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiationApplied Physics Letters, 1982
- Optical Properties of SemiconductorsPhysical Review B, 1963